The researchers from the Chinese Academy of Sciences have made a significant breakthrough in achieving the highest output power for 193- and 221-nm lasers using LBO crystals. This breakthrough opens up new possibilities for more applications in the deep ultraviolet (DUV) spectrum.

In recent years, high-power lasers in the DUV spectrum have been widely used in areas such as defect inspection, spectroscopy, lithography, and metrology. However, the ArgonFluoride (ArF) laser has been the go-to option for generating high-power 193 nm lasers for applications such as lithography.

With this new achievement by researchers from the Chinese Academy of Sciences, LBO crystals may represent a viable alternative to achieve even higher output power in the DUV spectrum. This could lead to advances in existing DUV applications and enable new opportunities in this area.

By Samantha Johnson

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